Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
2005 | Response to “Comment on ‘Direct evidence of nanocluster-induced luminescence in InGaN epifilms | Chang, H. J.; Chen, C. H.; Chen, Y. F.; Lin, T. Y.; Chen, L. C.; Chen, K. H.; Lan, Z. H. | APPLIED PHYSICS LETTERS 87, 136102 | | | |
2002 | Selective-area growth of indium nitride nanowires on gold-patterned Si(100) substrates | Liang, C. H.; Chen, L. C.; Hwang, J. S.; Chen, K. H.; Hung, Y. T.; Chen, Y. F. | APPLIED PHYSICS LETTERS 81, 22-24 | | | |
1999 | Silicon Carbon Nitride Films Deposited by ECR CVD | Chen, K. H.; Wu, J. J.; Wen, C. Y.; Chen, L. C.; Fan, C. W.; Kuo, P. F.; Chen, Y. F.; Huang, Y. S. | State-0f-the-Art Program on Compound Semiconductors XXX, 99, 13-24, Ed. C.R. Abernathy et al. | | | |
2003 | Synthesis and characterization of core-shell GaP@GaN and GaN@GaP nanowires | Lin, H. M.; Chen, Y. L.; Yang, J.; Liu, Y. C.; Yin, K. M.; Kai, J. K.; Chen, F. R.; Chen, L. C.; Chen, Y. F.; Chen, C. C. | NANO LETTERS 3, 537-541 | | | |
1997 | Temperature dependence of the direct band gap of Si-containing carbon nitride crystalline films | Lin, D. Y.; Li, C. F.; Huang, Y. S.; Jong, Y. C.; Chen, Y. F.; Chen, L. C.; Chen, C. K.; Chen, K. H. ; Bhusari, D. M. | Physical Review B 56(11), 6498-6501 | | | |
2005 | The influence of Fe concentration on Y3Al5-xFexO12 garnets | Chen, Y. F.; Wu, K. T.; Yao, Y. D.; Peng, C. H.; You, K. L.; Tse, W. S. | MICROELECTRONIC ENGINEERING81(2-4), 329-335 | | | |
2001 | Thermal diffusivity in amorphous silicon carbon nitride thin films by the traveling wave technique | Chattopadhyay, S.; Chen, L. C.; Wu, C. T.; Chen, K. H.; Wu, J. S.; Chen, Y. F.; Lehmann, G.; Hess, P. | APPLIED PHYSICS LETTERS 79, 332-334 | | | |
1999 | Wide Band Gap Silicon Carbon Nitride Films Deposited by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition | Chen, K. H.; Wu, J. J.; Wen, C. Y.; Chen, L. C.; Fan, C. W.; Kuo, P. F.; Chen, Y. F.; Huang, Y. S. | THIN SOLID FILMS 355-356, 205-209 | | | |
1999 | X-ray absorption of Si–C–N thin films: A comparison between crystalline and amorphous phases | Chang, Y. K.; Hsieh, H. H.; Pong, W. F.; Tsai, M. H.; Dann, T. E.; Chien, F. Z.; Tseng, P. K.; Chen, L. C.; Wei, S. L.; Chen, K. H. ; Wu, J. J.; Chen, Y. F. | Journal of Applied Physics 86(10), 5609-5613 | | | |