http://ir.sinica.edu.tw/handle/201000000A/44142
Title: | Silicon Carbon Nitride Films Deposited by ECR CVD | Authors: | Chen, K. H. Wu, J. J. Wen, C. Y. Chen, L. C. Fan, C. W. Kuo, P. F. Chen, Y. F. Huang, Y. S. |
Issue Date: | 1999 | Relation: | State-0f-the-Art Program on Compound Semiconductors XXX, 99, 13-24, Ed. C.R. Abernathy et al. | URI: | http://ir.sinica.edu.tw/handle/201000000A/44142 |
Appears in Collections: | 原子與分子科學研究所 |
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