Thermal diffusivity in amorphous silicon carbon nitride thin films by the traveling wave technique

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/44016

Title:	Thermal diffusivity in amorphous silicon carbon nitride thin films by the traveling wave technique
Authors:	Chattopadhyay, S. Chen, L. C. Wu, C. T. Chen, K. H. Wu, J. S. Chen, Y. F. Lehmann, G. Hess, P.
Issue Date:	2001
Relation:	APPLIED PHYSICS LETTERS 79, 332-334
URI:	http://ir.sinica.edu.tw/handle/201000000A/44016
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0003-6951&DestApp=JCR&RQ=IF_CAT_BOXPLOT
Appears in Collections:	原子與分子科學研究所

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