http://ir.sinica.edu.tw/handle/201000000A/49293| DC 欄位 | 值 | 語言 |
|---|---|---|
| dc.contributor | 物理研究所 | - |
| dc.contributor.author | S.-K. Hung | - |
| dc.contributor.author | K.-H. Lin | - |
| dc.contributor.author | C.-C. Chen | - |
| dc.contributor.author | C.-H. Chou | - |
| dc.contributor.author | Y.-C. Lin | - |
| dc.date.accessioned | 2020-10-27T03:40:14Z | - |
| dc.date.available | 2020-10-27T03:40:14Z | - |
| dc.date.issued | 2016-05 | - |
| dc.identifier.issn | http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0030-3992&DestApp=JCR&RQ=IF_CAT_BOXPLOT | - |
| dc.identifier.uri | http://ir.sinica.edu.tw/handle/201000000A/49293 | - |
| dc.description.sponsorship | 物理研究所 | - |
| dc.language.iso | en | - |
| dc.relation.ispartof | OPTICS AND LASER TECHNOLOGY 79 | - |
| dc.title | Total-internal-reflection-based photomask for large-area photolithography | - |
| dc.type | journal article | - |
| dc.identifier.url | http://www.sciencedirect.com/science/article/pii/S0030399215303340 | - |
| dc.description.note | 已出版;[SCI];有審查制度;具代表性 | - |
| item.languageiso639-1 | en | - |
| item.cerifentitytype | Publications | - |
| item.grantfulltext | none | - |
| item.openairetype | journal article | - |
| item.fulltext | no fulltext | - |
| item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
| 顯示於： | 物理研究所 | |
在 IR 系統中的文件，除了特別指名其著作權條款之外，均受到著作權保護，並且保留所有的權利。
