Total-internal-reflection-based photomask for large-area photolithography

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/49293

Title:	Total-internal-reflection-based photomask for large-area photolithography
Authors:	S.-K. Hung K.-H. Lin C.-C. Chen C.-H. Chou Y.-C. Lin
Issue Date:	2016-05
Relation:	OPTICS AND LASER TECHNOLOGY 79
URI:	http://ir.sinica.edu.tw/handle/201000000A/49293
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0030-3992&DestApp=JCR&RQ=IF_CAT_BOXPLOT
URL:	http://www.sciencedirect.com/science/article/pii/S0030399215303340
Appears in Collections:	物理研究所

Show full item record

Last Week
0

Last month
0

checked on Jan 3, 2023

Check