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  1. Scholars Hub of the Academia Sinica
  2. 數理科學組
  3. 物理研究所
Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/48726
Title: Effect of copper content on the electrical stability of nickel oxide films
Authors: S. C. Chen
T. Y. Kuo
S. U. Jen
H. P. Chiang
W. Y. Liu
C. H. Wang
Issue Date: 2015-04
Relation: THIN SOLID FILMS 584, 238-242
URI: http://ir.sinica.edu.tw/handle/201000000A/48726
ISSN: http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0040-6090&DestApp=JCR&RQ=IF_CAT_BOXPLOT
Appears in Collections:物理研究所

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