Reaction-limited graphene CVD surpasses silicon production rate

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/81424

Title:	Reaction-limited graphene CVD surpasses silicon production rate
Authors:	Chin, Hao-Ting Nguyen, Hai-Thai Chen, Szu-Hua Chen, Yi-Fang Chen, Wei-Hung Chou, Zhi-Yang Chu, Yi-Hung Yen, Zhi-Long Ting, Chu-Chi Hofmann, Mario Hsieh, Ya-Ping
Issue Date:	2021-07
Relation:	2D Materials 8(3):035016
URI:	http://ir.sinica.edu.tw/handle/201000000A/81424
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=2053-1583&DestApp=JCR&RQ=IF_CAT_BOXPLOT
URL:	http://dx.doi.org/10.1088/2053-1583/abf235
Appears in Collections:	原子與分子科學研究所

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