http://ir.sinica.edu.tw/handle/201000000A/81424
DC Field | Value | Language |
---|---|---|
dc.contributor | 原子與分子科學研究所 | - |
dc.contributor.author | Chin, Hao-Ting | - |
dc.contributor.author | Nguyen, Hai-Thai | - |
dc.contributor.author | Chen, Szu-Hua | - |
dc.contributor.author | Chen, Yi-Fang | - |
dc.contributor.author | Chen, Wei-Hung | - |
dc.contributor.author | Chou, Zhi-Yang | - |
dc.contributor.author | Chu, Yi-Hung | - |
dc.contributor.author | Yen, Zhi-Long | - |
dc.contributor.author | Ting, Chu-Chi | - |
dc.contributor.author | Hofmann, Mario | - |
dc.contributor.author | Hsieh, Ya-Ping | - |
dc.date.accessioned | 2022-02-17T01:48:43Z | - |
dc.date.available | 2022-02-17T01:48:43Z | - |
dc.date.issued | 2021-07 | - |
dc.identifier.issn | http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=2053-1583&DestApp=JCR&RQ=IF_CAT_BOXPLOT | - |
dc.identifier.uri | http://ir.sinica.edu.tw/handle/201000000A/81424 | - |
dc.description.sponsorship | 原子與分子科學研究所 | - |
dc.language.iso | en | - |
dc.relation.ispartof | 2D Materials 8(3):035016 | - |
dc.title | Reaction-limited graphene CVD surpasses silicon production rate | - |
dc.type | journal article | - |
dc.identifier.url | http://dx.doi.org/10.1088/2053-1583/abf235 | - |
dc.description.note | 已出版;[SCI];有審查制度 | - |
item.languageiso639-1 | en | - |
item.cerifentitytype | Publications | - |
item.grantfulltext | none | - |
item.openairetype | journal article | - |
item.fulltext | no fulltext | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
crisitem.author.dept | Institute of Atomic and Molecular Sciences | - |
crisitem.author.parentorg | Division of Mathematics and Physical Sciences | - |
Appears in Collections: | 原子與分子科學研究所 |
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