http://ir.sinica.edu.tw/handle/201000000A/46615| DC Field | Value | Language |
|---|---|---|
| dc.contributor | 物理研究所 | - |
| dc.contributor.author | Kuo, Hong-Shi | - |
| dc.contributor.author | Tsai, Wen-Ta | - |
| dc.date.accessioned | 2020-10-27T03:29:34Z | - |
| dc.date.available | 2020-10-27T03:29:34Z | - |
| dc.date.issued | 2000 | - |
| dc.identifier.uri | http://ir.sinica.edu.tw/handle/201000000A/46615 | - |
| dc.description.sponsorship | 物理研究所 | - |
| dc.language.iso | en | - |
| dc.relation.ispartof | JOURNAL OF THE ELECTROCHEMICAL SOCIETY147( 6), 2136 | - |
| dc.title | Effect of Applied Potential on the Chemical-Mechanical Polishing of Aluminum in Phosphoric Acid Base Slurry | - |
| dc.type | journal article | - |
| dc.description.note | 已出版;[SCI];有審查制度;具代表性 | - |
| item.languageiso639-1 | en | - |
| item.cerifentitytype | Publications | - |
| item.grantfulltext | none | - |
| item.openairetype | journal article | - |
| item.fulltext | no fulltext | - |
| item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
| Appears in Collections: | 物理研究所 | |
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