Effect of carbon sources on silicon carbon nitride films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/44041

Title:	Effect of carbon sources on silicon carbon nitride films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor
Authors:	Wu, J. J. Chen, K. H. Wen, C. -Y. Chen, L. C. Lo, H. J. Lin, S. T.
Issue Date:	2000
Relation:	DIAMOND AND RELATED MATERIALS 9, 556-561
URI:	http://ir.sinica.edu.tw/handle/201000000A/44041
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0925-9635&DestApp=JCR&RQ=IF_CAT_BOXPLOT
Appears in Collections:	原子與分子科學研究所

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