http://ir.sinica.edu.tw/handle/201000000A/43874
Title: | 5 nm Ruthenium Thin Film as a Directly Plateable Copper Diffusion Barrier | Authors: | Arunagiri, T. N. Zhang, Y. Chyan, O. El-Bounani, M. Kim, M. J. Wu, C. T. Chen, L. C. Chen, K. H. |
Issue Date: | 2005 | Relation: | APPLIED PHYSICS LETTERS 86,083104 | URI: | http://ir.sinica.edu.tw/handle/201000000A/43874 | ISSN: | http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0003-6951&DestApp=JCR&RQ=IF_CAT_BOXPLOT |
Appears in Collections: | 原子與分子科學研究所 |
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