http://ir.sinica.edu.tw/handle/201000000A/43874| DC Field | Value | Language |
|---|---|---|
| dc.contributor | 原子與分子科學研究所 | - |
| dc.contributor.author | Arunagiri, T. N. | - |
| dc.contributor.author | Zhang, Y. | - |
| dc.contributor.author | Chyan, O. | - |
| dc.contributor.author | El-Bounani, M. | - |
| dc.contributor.author | Kim, M. J. | - |
| dc.contributor.author | Wu, C. T. | - |
| dc.contributor.author | Chen, L. C. | - |
| dc.contributor.author | Chen, K. H. | - |
| dc.date.accessioned | 2020-10-26T03:21:42Z | - |
| dc.date.available | 2020-10-26T03:21:42Z | - |
| dc.date.issued | 2005 | - |
| dc.identifier.issn | http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0003-6951&DestApp=JCR&RQ=IF_CAT_BOXPLOT | - |
| dc.identifier.uri | http://ir.sinica.edu.tw/handle/201000000A/43874 | - |
| dc.description.sponsorship | 原子與分子科學研究所 | - |
| dc.language.iso | en | - |
| dc.relation.ispartof | APPLIED PHYSICS LETTERS 86,083104 | - |
| dc.title | 5 nm Ruthenium Thin Film as a Directly Plateable Copper Diffusion Barrier | - |
| dc.type | journal article | - |
| dc.description.note | 已出版;[SCI];有審查制度;具代表性 | - |
| item.openairetype | journal article | - |
| item.grantfulltext | none | - |
| item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
| item.fulltext | no fulltext | - |
| item.languageiso639-1 | en | - |
| item.cerifentitytype | Publications | - |
| Appears in Collections: | 原子與分子科學研究所 | |
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