http://ir.sinica.edu.tw/handle/201000000A/34602| Title: | Optimized reactive ion etching process for the fabrication of high-aspect-ratio silicon nanopillar arrays | Authors: | Chang, Yu-Fen Chou, Qiong-Ru Lin, Jiunn-Yuan Lee, Chau-Hwang |
Issue Date: | 2006 | Conference: | MicroTAS (Tokyo, Japan : Society for Chemistry and Micro-Nano Systems) | URI: | http://ir.sinica.edu.tw/handle/201000000A/34602 |
| Appears in Collections: | 應用科學研究中心 |
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