Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching

請用此 Handle URI 來引用此文件： http://ir.sinica.edu.tw/handle/201000000A/33817

題名:	Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching
作者:	Lee, Chau-Hwang Chang, Ting-Wei Lee, Kuang-Li Lin, Jiunn-Yuan Wang, Jyhpyng
公開日期:	2004-12-01
關聯:	APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 79, 2027-2031
URI:	http://ir.sinica.edu.tw/handle/201000000A/33817
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0947-8396&DestApp=JCR&RQ=IF_CAT_BOXPLOT
顯示於：	應用科學研究中心

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