Performance Improvement of AlGaAs/GaAs QWIP by NH3 Plasma Treatment

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/33718

Title:	Performance Improvement of AlGaAs/GaAs QWIP by NH3 Plasma Treatment
Authors:	Lee, J. H. Chang, C. Y. Li, C. H. Lin, S. Y. Lee, S. C.
Issue Date:	2012-07-01
Relation:	IEEE JOURNAL OF QUANTUM ELECTRONICS vol. 48, no. 7, pp. 922-926
URI:	http://ir.sinica.edu.tw/handle/201000000A/33718
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0018-9197&DestApp=JCR&RQ=IF_CAT_BOXPLOT
Appears in Collections:	應用科學研究中心

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