Local Electronic Structure and Electrical Characteristics of Nitrogen-Doped ZnO Films Grown by Remote Plasma Atomic Layer Deposition

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/33123

Title:	Local Electronic Structure and Electrical Characteristics of Nitrogen-Doped ZnO Films Grown by Remote Plasma Atomic Layer Deposition
Authors:	Chien, Jui-Fen Chen, Ching-Hsiang Shyue, Jing-Jong Chen, Miin-Jang
Issue Date:	2012
Relation:	ACS Applied Materials & Interfaces 4 [7] 3471-3475
URI:	http://ir.sinica.edu.tw/handle/201000000A/33123
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=1944-8244&DestApp=JCR&RQ=IF_CAT_BOXPLOT
Appears in Collections:	應用科學研究中心

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