High-κ samarium-based metal─organic framework for gate dielectric applications

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/45331

Title:	High-κ samarium-based metal─organic framework for gate dielectric applications
Authors:	A. Pathak G.R. Chiou N.R. Gade M. Usman S. Mendiratta T.T. Luo T.W. Tseng J.W. Chen F.R. Chen K.H. Chen L.C. Chen K.L. Lu
Issue Date:	2017
Relation:	ACS APPLIED MATERIALS & INTERFACES 9(26), 21872-21878
URI:	http://ir.sinica.edu.tw/handle/201000000A/45331
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=1944-8244&DestApp=JCR&RQ=IF_CAT_BOXPLOT
Appears in Collections:	原子與分子科學研究所

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