Low-Temperature Microwave Annealing Processes for Future IC Fabrication—A Review

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/34144

Title:	Low-Temperature Microwave Annealing Processes for Future IC Fabrication—A Review
Authors:	Yao-Jen Lee Ta-Chun Cho Shang-Shiun Chuang Fu-Kuo Hsueh Yu-Lun Lu Po-Jung Sung Hsiu-Chih Chen Michael I. Current Tseung-Yuen Tseng Tien-Sheng Chao Chenming Hu Fu-Liang Yang
Issue Date:	2014-03
Relation:	IEEE TRANSACTIONS ON ELECTRON DEVICES 61, NO.3
URI:	http://ir.sinica.edu.tw/handle/201000000A/34144
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0018-9383&DestApp=JCR&RQ=IF_CAT_BOXPLOT
Appears in Collections:	應用科學研究中心

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