http://ir.sinica.edu.tw/handle/201000000A/87827
Title: | Deposition of high-quality Ge film on Si by PECVD using GeCl4/H2 for fabricating near-infrared photodiodes | Authors: | Jyun-You Lai Shang-Che Tsai Ming-Wei Lin Szu-yuan Chen |
Issue Date: | 2022-09 | Relation: | Materials Science in Semiconductor Processing 148:106740 | URI: | http://ir.sinica.edu.tw/handle/201000000A/87827 | ISSN: | http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=1369-8001&DestApp=JCR&RQ=IF_CAT_BOXPLOT | URL: | http://dx.doi.org/10.1016/j.mssp.2022.106740 |
Appears in Collections: | 原子與分子科學研究所 |
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