MCD and PEEM Studies of Magnetic Metal Thin Films Deposited on Topological Insulator (Poster)

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/73704

Title:	MCD and PEEM Studies of Magnetic Metal Thin Films Deposited on Topological Insulator (Poster)
Authors:	K. H. Ou Yang Y. H. Chu Z. Y. Huang C. W. Shih N. C. Hsu R. Sanker F. C. Chou C. I. Lu D. H. Wei F. H. Chang H. J. Lin Minn- Tsong Lin
Issue Date:	2018-05-25
Conference:	2018 International Symposium on Emergent Crystalline Materials in Taiwan (TCECM) (Taoyuan, Taiwan : TCECM)
URI:	http://ir.sinica.edu.tw/handle/201000000A/73704
Appears in Collections:	原子與分子科學研究所

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