http://ir.sinica.edu.tw/handle/201000000A/46616| Title: | Electrochemical Behavior of Aluminum during Chemical-Mechanical Polishing in Phosphoric Acid Base Slurry | Authors: | Kuo, Hong-Shi Tsai, Wen-Ta |
Issue Date: | 2000 | Relation: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY147 (1), 149 | URI: | http://ir.sinica.edu.tw/handle/201000000A/46616 |
| Appears in Collections: | 物理研究所 |
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