Recrystallization of copper at a solid interface for improved CVD graphene growth

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/45381

Title:	Recrystallization of copper at a solid interface for improved CVD graphene growth
Authors:	Ya-Ping Hsieh Ding-Rui Chen Wan-Yu Chiang Kai-Jyun Chen Mario Hofmann
Issue Date:	2017
Relation:	RSC Advances 7(7), 3736-3740
URI:	http://ir.sinica.edu.tw/handle/201000000A/45381
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=2046-2069&DestApp=JCR&RQ=IF_CAT_BOXPLOT
Appears in Collections:	原子與分子科學研究所

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