http://ir.sinica.edu.tw/handle/201000000A/44051
Title: | Effect of H-2 addition on SiCN film growth in an electron cyclotron resonance plasma chemical vapor deposition reactor | Authors: | Wu, J. -J. Chen, K. H. Wen, C. -Y. Chen, L. C. Yu, Y. -C. Wang, C. -W. Lin, E. -K. |
Issue Date: | 2000 | Relation: | JOURNAL OF MATERIALS CHEMISTRY 10, 783-787 | URI: | http://ir.sinica.edu.tw/handle/201000000A/44051 | ISSN: | http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0959-9428&DestApp=JCR&RQ=IF_CAT_BOXPLOT |
Appears in Collections: | 原子與分子科學研究所 |
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