http://ir.sinica.edu.tw/handle/201000000A/44036
Title: | Methylamine growth of SiCN films using ECR-CVD | Authors: | Wen, C. Y. Wu, J. J. Lo, H. J. Chen, L. C. Chen, K. H. Lin, S. T. Yu, Y. -C. Wang, C. -W. Lin, E. -K. |
Issue Date: | 1999 | Relation: | MRS Online Proceedings Library 606, 115 | URI: | http://ir.sinica.edu.tw/handle/201000000A/44036 |
Appears in Collections: | 原子與分子科學研究所 |
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