Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/44005

Title:	Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere
Authors:	Lin, H. Y. Chen, Y. C. Lin, C. Y. Tong, Y. P. Hwa, L. G. Chen, K. H. Chen, L. C.
Issue Date:	2002-09
Relation:	Thin Solid Films 416(1-2), 85-91
URI:	http://ir.sinica.edu.tw/handle/201000000A/44005
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0040-6090&DestApp=JCR&RQ=IF_CAT_BOXPLOT
URL:	http://dx.doi.org/10.1016/s0040-6090(02)00712-5
Appears in Collections:	原子與分子科學研究所

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