Generally Applicable Self-Masked Dry Etching Technique for Nanotip Array Fabrication.

Please use this identifier to cite or link to this item: http://ir.sinica.edu.tw/handle/201000000A/43854

Title:	Generally Applicable Self-Masked Dry Etching Technique for Nanotip Array Fabrication.
Authors:	Hsu, C. H. Lo, H. C. Chen, C. F. Wu, C. T. Hwang, J. H. Das, D. Tsai, J. Chen, L. C. Chen, K. H.
Issue Date:	2004
Relation:	NANO LETTERS 4,471-475
URI:	http://ir.sinica.edu.tw/handle/201000000A/43854
ISSN:	http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=1530-6984&DestApp=JCR&RQ=IF_CAT_BOXPLOT
Appears in Collections:	原子與分子科學研究所

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