http://ir.sinica.edu.tw/handle/201000000A/34024| Title: | Physical and Barrier Properties of Amorphous Silicon-Oxycarbide Deposited by PECVD from Octamethylcyclotetrasiloxane | Authors: | C.C. Chiang M.C. Chen L.J. Li Z.C. Wu S.M. Jang M.S. Liang |
Issue Date: | 2004 | Relation: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY 151, G612 | URI: | http://ir.sinica.edu.tw/handle/201000000A/34024 | ISSN: | http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Drexel&SrcApp=hagerty_opac&KeyRecord=0013-4651&DestApp=JCR&RQ=IF_CAT_BOXPLOT |
| Appears in Collections: | 應用科學研究中心 |
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