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Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link | |
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1 | 2019 | The atomic layer etching of molybdenum disulfides using low-power oxygen plasma | Kuan-Chao Chen; Chia-Wei Liu; Chi Chen; Shih-Yen Lin | Semiconductor Science and Technology 34(4), 045007 |