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Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link | |
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1 | 2004 | Fabricating high-aspect-ratio sub-diffraction-limit structures on silicon with two-photon photopolymerization and reactive ion etching | Lee, Chau-Hwang ; Chang, Ting-Wei; Lee, Kuang-Li; Lin, Jiunn-Yuan; Wang, Jyhpyng | APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 79, 2027-2031 |