Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
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2002 | Growth of High-Quality Epitaxial InN Film with High-Speed Reactant Gas by Organometallic Vapor-Phase Epitaxy | Yang, Fu-Hsiang; Hwang, Jih-Sheng; Yang, Ying-Jay; Chen, Kuei-Hsien ; Wang, Jih-Hsiang | Japanese Journal of Applied Physics 41(11B):L1321 |