| Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
|---|---|---|---|---|---|---|
| 2012 | Effect of substrate bias on the promotion of nanocrystalline silicon growth from He-diluted SiH4 plasma at low temperature | Das, D.; Raha, D.; Chen, W. C.; Chen, K. H.; Wu, C. T.; Chen, L. C. | JOURNAL OF MATERIALS RESEARCH 27, 1303-1313 |
