| Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
|---|---|---|---|---|---|---|
| 2023 | Deposition of GeSn film on Si substrate by plasma-enhanced chemical vapor deposition using GeCl4 and SnCl4 in H2 for developing short-wave infrared Si photonics | Tzu-Hung Yang; Zhe-Zhang Lin; Shang-Che Tsai; Jia-Zhi Dai; Shih-Ming Chen; Ming-Wei Lin; Szu-yuan Chen | MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING 162:107515 |
