Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
---|---|---|---|---|---|---|
2015 | Dopant Morphology as the Factor Limiting Graphene Conductivity | M. Hofmann; Y. P. Hsieh; K. W. Chang; H. G. Tsai; T. T. Chen | SCIENTIFIC REPORTS 5:17393 | |||
2016 | Reducing the Graphene Grain Density in Three Steps | Y. P. Hsieh; Y. H. Chu; H. G. Tsai; M. Hofmann | NANOTECHNOLOGY 27:105602 |