| Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
|---|---|---|---|---|---|---|
| 2005 | 5 nm Ruthenium Thin Film as a Directly Plateable Copper Diffusion Barrier | Arunagiri, T. N.; Zhang, Y.; Chyan, O.; El-Bounani, M.; Kim, M. J.; Wu, C. T.; Chen, L. C.; Chen, K. H. | APPLIED PHYSICS LETTERS 86,083104 |
