Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
---|---|---|---|---|---|---|
2012 | In-plane gate transistors with 40 $\mu$m wide channel width | Chung, T. H.; Lin, W. H.; Chao, Y. K.; Chang, S. W.; Lin, S. Y. | IEEE ELECTRON DEVICE LETTERS 33(8), 1129-1131 | |||
2009 | The Influence of Pre-oxidation Treatment on Nano Oxides Fabricated by AFM Nano-Oxidation | Chung, T. H.; Liao, W. H.; Cheng, J. L.; Tesng, C. C.; Lin, S. Y. |