Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
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2012 | Performance Improvement of AlGaAs/GaAs QWIP by NH3 Plasma Treatment | Lee, J. H.; Chang, C. Y.; Li, C. H.; Lin, S. Y.; Lee, S. C. | IEEE JOURNAL OF QUANTUM ELECTRONICS vol. 48, no. 7, pp. 922-926 |