Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
---|---|---|---|---|---|---|
2019 | The atomic layer etching of molybdenum disulfides using low-power oxygen plasma | Kuan-Chao Chen; Chia-Wei Liu; Chi Chen; Shih-Yen Lin | Semiconductor Science and Technology 34(4), 045007 |