Issue Date | Title | Author(s) | Relation | scopus | WOS | Fulltext/Archive link |
---|---|---|---|---|---|---|
1999 | Wide Band Gap Silicon Carbon Nitride Films Deposited by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition | Chen, K. H.; Wu, J. J.; Wen, C. Y.; Chen, L. C.; Fan, C. W.; Kuo, P. F.; Chen, Y. F.; Huang, Y. S. | THIN SOLID FILMS 355-356, 205-209 |